Polyimide (PI) ICP Etching for Failure Analysis

PI has applications can be used for Failure Analysis. It has excellent process repeatability and clean removal of a wide range of materials is possible, without lifting of metal tracks.

  PlasmaPro System133 ICP380
Etch rate: お問い合わせください
Uniformity: お問い合わせください
Selectivity to SiNx: お問い合わせください
Wafer size: お問い合わせください