Zinc Oxide (ZnO) ALD

ZnO has applications in optoelectronics and transparent conductive oxide (TCO) and may be deposited using Atomic Layer Deposition (ALD). Process benefits include true self-limiting ALD behaviour, high repeatability and high conformality.










Process Specification

Precursors: お問い合わせください
Non-metal precursors: お問い合わせください
Temperature range: お問い合わせください
Growth rate per cycle: お問い合わせください
Deposition rate: お問い合わせください
Refractive Index: お問い合わせください
Uniformity: お問い合わせください