Aluminium Nitride (AlN) Sputter Deposition
TiN has may be deposited using Physical Vapour Deposition (PVD), also known as Sputter Deposition.
Process Specification
|
|
PlasmaPro System400 |
|
Deposition rate: |
お問い合わせ下さい |
|
Refractive Index: |
お問い合わせ下さい |
|
Uniformity: |
お問い合わせ下さい |
|
Single wafer size: |
お問い合わせ下さい |
|
Batch size: |
お問い合わせ下さい
|