Aluminium Nitride (AlN) Sputter Deposition
TiN has may be deposited using Physical Vapour Deposition (PVD), also known as Sputter Deposition.
Process Specification
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PlasmaPro System400 |
Deposition rate: |
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Refractive Index: |
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Uniformity: |
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Single wafer size: |
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Batch size: |
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