Bismuth Telluride (Bi2Te3) Etching

Bi2Te3 has applications in Peltier coolers and in energy harvesting (the conversion of temperature differences into electrical energy). Bi2Te3 and related films may be dry etched using the Inductively Coupled Plasma (ICP) Etch process technique.

SEM image shows 20µm Bi2Te3 Etched by ICP - RIE with kind permission of Infineon Technologies AG, Fraunhofer - IPM Freiburg

  PlasmaPro100 ICP65 PlasmaPro100 ICP180 PlasmaPro100 ICP380
Etch rate: お問い合わせ下さい お問い合わせ下さい お問い合わせ下さい
Uniformity: お問い合わせ下さい お問い合わせ下さい お問い合わせ下さい
Selectivity to PR: お問い合わせ下さい お問い合わせ下さい お問い合わせ下さい
Wafer size: お問い合わせ下さい お問い合わせ下さい お問い合わせ下さい