Gallium Phosphide (GaP) Lens Etching

GaP lens may be dry etched using Inductively Coupled Plasma (ICP) Etching with a photoresist mask.

SEM image shows a typical GaP lens etch structure, Photoresist as a mask

 

 

 

 

Process Specification

  PlasmaPro 100 ICP180 PlasmaPro 100 ICP380
Etch Rate: お問い合わせください お問い合わせください
Selectivity to PR: お問い合わせください お問い合わせください
Uniformity: お問い合わせください お問い合わせください
Wafer size: お問い合わせください お問い合わせください