Ruthenium (Ru) Atomic Layer Deposition (ALD)

 

Ru has applications in barrier layers and metal electrodes and may be deposited using Atomic Layer Deposition  (ALD).

 

 

 

 

 

 

 

 

 

 

Process Specification

Precursors: お問い合わせください
Non-metal precursors: お問い合わせください
Temperature range: お問い合わせください