Zinc Oxide (ZnO) Deposition

ZnO may be deposited using the following process types:

Zinc Oxide (ZnO) Sputter Deposition 

Aluminium doped Zinc Oxide (ZnO) Sputter Deposition

ZnO has may be deposited using Physical Vapour Deposition (PVD), also known as Sputter Deposition.

 

 

 

Process Specification

  PlasmaPro 100
Deposition rate: お問い合わせください
Refractive Index: お問い合わせください
Uniformity: お問い合わせください
Single wafer size: お問い合わせください

 

Zinc Oxide (ZnO) Atomic Layer Deposition (ALD) 

Zinc Oxide (ZnO) ALD

ZnO has applications in optoelectronics and transparent conductive oxide (TCO) and may be deposited using Atomic Layer Deposition (ALD). Process benefits include true self-limiting ALD behaviour, high repeatability and high conformality.

 

 

 

 

 

 

 

 

 

Process Specification

Precursors: お問い合わせください
Non-metal precursors: お問い合わせください
Temperature range: お問い合わせください
Growth rate per cycle: お問い合わせください
Deposition rate: お問い合わせください
Refractive Index: お問い合わせください
Uniformity: お問い合わせください