Titanium Oxide (TiO2) Sputter Deposition

TiO2 may be deposited using Physical Vapour Deposition  (PVD), also known as Sputter Deposition.

 

 

 

Process Specification

  PlasmaPro System400
Deposition rate: お問い合わせください
Uniformity: お問い合わせください
Single wafer size: お問い合わせください
Batch size: お問い合わせください