Hafnium Oxide (HfO2) Reactive Ion Beam Deposition (RIBD)

Process features:

  • Etch source available for pre-clean
  • Deposition Gases: Ar, O2

 

 

 

 

 

 

 

 

Summary performance data:

Chamber base pressurea お問い合わせください
Load lock base pressureb お問い合わせください

 

Process specification

1. HfO2 deposition with rotation and adjustable tilt