Titanium Nitride (TiN) Deposition

TiN may be deposited using the following process types:

Titanium Nitride (TiN) Atomic Layer Deposition (ALD) 

Titanium Nitride (TiN) Atomic Layer Deposition (ALD)

TiN may be deposited using Atomic Layer Deposition  (ALD).

 

 

 

 

 

 

 

 

 

 

 

 

Process Specification

Precursors: お問い合わせ下さい
Non-metal precursors: お問い合わせ下さい
Temperature range: お問い合わせ下さい
Growth rate per cycle: お問い合わせ下さい
Deposition rate: お問い合わせ下さい
Uniformity: お問い合わせ下さい
 

 

Titanium Nitride (TiN) Sputter Deposition 

Titanium Nitride (TiN) Deposition

TiN has may be deposited using Physical Vapour Deposition  (PVD), also known as Sputter Deposition.

 

 

 

Process Specification