Aluminium Nitride (AlN) Deposition

AlN may be deposited using the following process types:

Aluminium Nitride (AlN) Sputter Deposition 

Aluminium Nitride (AlN) Sputter Deposition

TiN has may be deposited using Physical Vapour Deposition (PVD), also known as Sputter Deposition.

Process Specification

  PlasmaPro System400
Deposition rate: お問い合わせ下さい
Refractive Index: お問い合わせ下さい
Uniformity: お問い合わせ下さい
Single wafer size: お問い合わせ下さい
Batch size: お問い合わせ下さい
 

 

Aluminium Nitride (AlN) Atomic Layer Deposition (ALD) 

Aluminium Oxide (AlN) ALD

AlN may be deposited using Atomic Layer Deposition  (ALD).

Process Specification

Precursors: お問い合わせ下さい
Non-metal precursors: お問い合わせ下さい
Temperature range: お問い合わせ下さい
Growth rate per cycle: お問い合わせ下さい
Deposition rate: お問い合わせ下さい
Refractive Index: お問い合わせ下さい
Uniformity: お問い合わせ下さい